X-ray Photoelectron Spectroscopy (XPS)
Uses
Applications
Technical Specifications
Alternatives
X-ray Photoelectron Spectroscopy (XPS) is a surface chemical analysis technique used to measure the elemental and chemical state information for concentrations above 0.1 to 1 atomic% depending on the element in the outermost 20Å - 50Å of a surface. All elements except H and He can be detected using this technique. In conjunction with an Ar+ ion beam, elemental and chemical composition can be characterized as a function of depth at a very high resolution. This capability is useful in characterizing interfaces. The advantages of XPS is its ability to analyze non-conducting materials, such as ceramics and plastics, with minimum charging effects and the ability to relate small shifts in the peak positions to differences in the chemical state. Small spot (up to 10 micron spot) capability is also useful in elemental and chemical state mapping of surfaces.
- Obtaining chemical bonding information from species on solid surfaces
- Quantitative elemental analysis of surface contamination at the low % level
- Identification of carbon bonding structure of organic surface contaminants
- Detection of chemical bond formation in mixed-metal powders
- Determining metal-oxide stoichiometry of deposited thin films
- To obtain elemental analysis of small areas on surfaces: AES
- For higher sensitivity quantitative elemental analysis of surfaces: SIMS, TXRF, VPD-ICP-MS
- To obtain composition of bulk materials: AES, SIMS