Vapor Phase Decomposition Inductively Coupled Plasma Mass Spectrometry (VPD-ICP-MS)
Uses
Applications
Technical Specifications
Alternatives
Vapor Phase Decomposition Inductively Coupled Plasma Mass Spectrometry (VPD-ICP-MS) is a technique used to monitor trace elements on un-patterned wafer surfaces.
- Ultra-high sensitivity quantitative analysis of elemental contamination on Si surfaces
- Detection of metal contamination at the E08 atoms/cm2 level for most elements
- Detection limits down to E07 atoms/cm2
- For site-specific analysis of elemental surface contamination: AES, SIMS, TXRF, XPS
- To obtain composition of bulk materials: AES, SIMS