Total Reflection X-ray Fluorescence (TXRF)
Uses
Applications
Technical Specifications
Alternatives
Total Reflection X-ray Fluorescence (TXRF) is a technique used for surface elemental ultra-trace analysis of particles, residues, and impurities on smooth surfaces. TXRF is widely used for wafer surface contamination in semiconductor test wafer and chip manufacturing.
- High sensitivity quantitative analysis of elemental contamination on solid surfaces
- Non-destructive mapping of elemental distributions
- Detection of metal contamination at the E09 atoms/cm2 level for most elements
- Monitoring thin film deposition
- For analysis of elements lighter than Si: VPD-ICP-MS
- For surface analysis of patterned wafers or rough surfaces: AES, SIMS, XPS
- To obtain composition of bulk materials: AES, SIMS